Edwards STP301, STP603, STP1003 is for use in electron microscopes and semiconductor applications.Edwards rotor technology gives class-leading performance for

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maximum process flexibility.

These STP TMP has been approved for use by major equipment manufacturers in the scientific instrument, semiconductor and magnetic media industries.STP pump is supplied with an inlet screen.

For a complete installation order an STP pump, a controller, a connection cable and power cable.

Corrosive versions are available as well.

Features and Benefits

  • Advanced rotor design
  • Higher gas throughput
  • Maximized process flexibility
  • 5 Axis Magnetic Suspension System
  • Zero contamination


  • Plasma etch (chlorine, fluorine and bromine chemistries) for metal (aluminium), tungsten and dialectric (oxide) and polysilicon
  • Electron cyclotron resonance (ECR) etch
  • Film deposition CVD, PECVD, ECRCVD, MOCVD
  • Sputtering
  • Ion implantation source, beam line pumping and station

STP301, STP603, STP1003

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